Mastering the Magic of Multi-Patterning
December 5, 2013 === === Multi-patterning technology was introduced at the 20 nm node to overcome lithographic limitations in current IC manufacturing processes. While processes like double and triple patterning may sometimes seem like magic, successfully implementing multi-patterning compliance in the IC design and verification flow requires a thorough understanding of multi-patterning techniques and their impact on your design. Learn what multi-patterning is, why you need it, and how CalibreĀ® Multi-Patterning software can help you effectively and efficiently incorporate multi-patterning into your leading-edge designs.

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