Latest advances in plasma techniques used for atomic layer deposition

Atomic layer deposition (ALD) has established itself as the deposition technique of choice for ultra-thin, controlled, conformal, pin-hole free coatings. In an age of nanotechnology advances ALD is an ideal tool for depositing on nanoscale features.
 
Professor Erwin Kessels covers:
  • recent advances in plasma ALD processing through careful control of the ion energies and plasma conditions to tune the properties of the materials being deposited.
  • applications of ALD that have benefited from advanced plasma techniques.
The webinar runs for 45 minutes and includes a question and answer session at the end.

Speakers

Prof. Erwin Kessels
Eindhoven University of Technology
 
Chris Hodson
ALD product manager, Oxford Instruments

James Tyrrell
Editor, nanotechweb.org

Oxford Instruments webinar

 

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